Appellation

OLED-450 Devices System series

Coating method

Double target magnetrons sputter film coating and resistance heating evaporation.

Film types

Metal film and organic film.

power supply

Bipolar pulse sources*2, RF source*1, Evaporation source*1

Target and electrode structure

Φ50.8mm Cylindrical surface target and Water cooling evaporation electrode*2

Vacuum chamber

Vertical door in the front, Exhaust systems in the backWork piece operation mode: 020rpm Adjustable CVT revolution. Vacuum measurement methods: digital composite vacuum gauge, Measurement range from atmospheric to 10^-5Pa.

Samples

Available water cooing, heating, revolution and are able to monitor the sample thickness monitor.

Utmost Vacuum

6×10^-5Pa

Vacuum system components

Molecular pump and mechanical pumps

Pumping speed

less than or equal to 20mm from the air to 10^-3Pa

Thickness nonuniformity

≤±5%

Workpiece baking temperature

adjustable from room temperature to 500(PID Control)

Vacuum control

A, B, C-type is manual control

Gas control

Gas control system*2, Gas flow control ranged 100/200 sccm,Accuracy ±0.1sccm.

Protection

protective measures of lack of water of pump and other targets, flow over pressure, the open circuit and other abnormal situations

Electric power

≥12KW,occupy area8m2.

Option devices

Hall ion source, 0~-1000V negative bias voltage, and the circulating water machine