Type

ZHD450 A

ZHD450 B

ZHD450 C

Coating method

Resistance evaporation coating

Resistance / Electron beam evaporation coating

Resistance evaporation + Magnetron sputtering

Film types

Organic films or Metal films etc.

Multi-layer films, various Filter films, Reflection films, Transmission films,? etc.

Single substance films, Semiconductor films, Organic films, Oxide films, Reaction films, Dielectric films, Semiconductor films, OLED devices, etc.

Power supply

Evapourate power supply

Evapourate power supply, electron gun power supply

Evapourate power supply, pulse power supply

Electrodes and targets

electrodes

electrodes, e-type electron gun

electrodes, circular plane magnetron sputtering target

Vacuum control

Available Manual / PLC / PLC+HMI Control (optional)

Dimension of the vacuum chamber

Φ450×H500 mm

Vacuum chamber

Pre-open vertical structures, Postposition pumping systems, Manual push-and-pull manner

Vacuum pumps

Molecular / Diffusion pump + Mechanical pump

Pumping speed

Pumping time≤20 min (Molecular pump) / 50 min (Diffusion pump), from atmospheric pressure to 10-3Pa

Film uniformity

The fluctuations of the film thickness are less than 5%

Structure of the electrodes

Water-cooling electrodes

Baking temperature of the workpiece

Adjustable and controllable from room temperature to 300 °C (PID Temperature Control)

Movement of the workpiece

0-20 rpm adjustable and controllable stepless speed change revolution / rotation

Vacuum measurement

Two digital composite vacuum gauges

Protection

Alarm and automatic protection function for water depletion, abnormal flow, over current flowing, over voltage, and electrical shutdown, etc.

Basic parameters

Power≥12 KW; Served area: 12 m2; Weight: ~1200 kg

Optional devices

Quartz oscillator film thickness monitor, Water cooling & recycling machine