Appellation

Coating Series spherical

type

A type

Chamber size

Φ650mm×H650mm

Power supply

3000W Bipolar Pulse Generator*2

1000W Electromagnetic Power Target*1

Sputtering target structure

Φ50.8mmPermanent magnetic target *2 +Φ60mmElectromagnetic target *1

Vacuum chamber

Vertical gas springs open structure, post-exhaust systems; Workpiece operation mode: Public rotation, 0~20rpm, adjustable controlled CVTVacuum measurementDigital composite vacuum gaugeMeasurement range from atmospheric to 10^-5Pa

Coating method

Magnetron sputtering

Negative Bias voltage

0-300V

Film types

Metal films, reaction film, magnetic film, multilayer dielectric film, organic film, powder film

Workingpiece standard

Available water cooling, heating, revolution and rotation able to sample thickness monitor.

Base pressure

8×10^-5Pa

Vacuum system components

Molecular pump +  mechanical pumps

Pumping speed

less than or equal to 20min from the air to 10^-3Pa

membrane uniformity

≤±5%

Target and Target utilization rate

Target utilization rate 30%~60%;

Workpiece baking temperature

Adjustable controlled room temperature to 200 ° C (PID Temperature Control)

Vacuum control

Manual/Automatic Control

gas control

2 sets of gas control system,50/100sccm gas flow control precision ± 0.1sccm.

protection

Equipment is being driven, under compaction, flow, over-voltage protection devices

Others

power≥20KW,area9m²

Option devices

Quartz oscillator thickness devices Hall ion source, and the circulating water machines pump, PLC, PC control, the anti-laundering sputtering