Appellation

JPCD series plasma cleaning machine

type

A type

B type

C type

power supply

40KHzRF Generator

13.56MHzRF Generator

2.45GHzRF Generator

Vacuum chamber

Vertical door in the front, Exhaust systems in the backWork piece operation mode: 020rpm Adjustable CVT revolution. Vacuum measurement methods: digital composite vacuum gauge, Measurement range from atmospheric to 10^-4Pa.

Utmost Vacuum

6×10^-4PaDiffusion pump system

8×10^-5PaMolecular pump system

Vacuum system components

Diffusion pump and Mechanical pumps

or Molecular pump and Mechanical pumps

Electrodes and power

Efficient vacuum electrode, power is adjustable in the 500W.

Vacuum control

A, B, C-type is manual control

technics Gas control

Gas control system*1, Gas flow control ranged 50/100 sccm,Accuracy ±0.1sccm.

Automatic alarm protection systems

protective measures of lack of water of pump and other electrode, flow over pressure, the open circuit and other abnormal situations

Plasma Cleaning Machine has the following advantages

1, more flexibility to operate, and simple to change their procedures for handling the type of gas;

2, will not cause any damage to the body of scientific research personnel;

3, the cost is negligible for the plasma treatment;

4, efficient, high-quality cleaning function;