Vacuum Machine------JCP600 Multi-target magnetron sputtering machine series
Product Details:
| Certification | CE |
|---|---|
| Brand Name | TECHNOL |
| Model Number | JCP600 |
Detailed Product Description
vacuum machines --------JCP600 Multi-target magnetron sputtering machine series is magnetron sputtering film coating can be used to prepare single-layer or multi-layer metal film, the semiconductor film, film, insulation film magnetic recording layer optical recording film, a transparent conductive film, high temperature superconductor coating. Also in variants, powder coating surface. Applied research institutes in the teaching, research, small and medium enterprises of various plating film processing.
Products | JCP600 Multi-target Magnetron Sputtering Series | ||
Type | Type A | Type B | Type C |
Coating method | Pulse magnetron sputtering | Three-target or multi-target magnetron sputtering | RF/Pulse magnetron sputtering |
Film types | Metal films, reaction films.etc | Metal films, reaction films, magnetic films, multi-layer films | Metal films, dielectric films, reaction films, oxide films, organic films |
Power supply | bipolar pulse power supply | bipolar pulse power supply electromagnetron target power supply | bipolar pulse power supply RF power supply |
Structure of the sputtering target | rectangular target | cylindrical plane target electromagnetron target | cylindrical plane target |
Vacuum chamber | Pre-open vertical structures, Postposition pumping systems, 0?20 rpm stepless speed change, Digital composite vacuum gauges, Vacuum measurement ranging from atmospheric pressure to 10-5Pa | ||
Sample | Available water cooling, heating, revolution, rotation; Sample thickness monitoring and anti-sputtering cleaning | ||
Highest attained vacuum | 6.6×10-5 Pa | ||
Vacuum pumps | Molecular pump + Mechanical pump | ||
Pumping speed | Pumping time≤30 min, from atmospheric pressure to 10-3Pa | ||
Film uniformity | The fluctuations of the film thickness are less than 5% | ||
Baking temperature of the workpiece | Adjustable and controllable from room temperature to 300 °C (PID Temperature Control) | ||
Vacuum control | Available Manual / PLC / PLC + HMI / PC Control (optional) | ||
Gas flow control | Three Roads gas flow control | ||
Protection | Alarm and automatic protection function for water depletion, abnormal flow, over current flowing, over voltage, and electrical shutdown, etc. | ||
Basic parameters | Power≥12KW; Served area: 12m2 | ||
Optional devices | Quartz oscillator film thickness monitor, Hall ion source, minus bias, Deionized water cooling & cycling machine, electromagnetron targets and the power supply | ||
Vacuum Machine------JCP600 Multi-target magnetron sputtering machine series
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Company Info
Beijing Technol Science Co., Ltd.
[China (Mainland)]
[Verified Member]
City: Beijing
Province/State: Beijing
Country/Region : China (Mainland)
Business Type:Manufacturer, Trading Company, Buying Office, Agent, Distributor/Wholesaler, Government ministry/Bureau/Commission, Association, Business Service (Transportation, finance, travel, Ads, etc), Other
Online Postings: Products