Detailed Product Description

JCP-450D focused magnetron sputtering is a multifunction (non-standard type) coating equipment, and its main function
1) Focus-magnetron sputtering at the same time be arbitrarily focus magnetron sputtering target surface plasmon close relative, such as in vitro reach 1:3. Target utilization rate up to 60%.

2) PCVD--- physical and chemical vapor deposition; If necessary, add to the RF coil inductance power some neutral ionization ion sputtering to change the deposition film : physical, chemical and optical properties.
3) PECVD--- inductively coupled plasma-enhanced chemical vapor deposition. As inductively placed coating room, and the result of ionizing superior coupling cavity coupled in vitro.
4) wokingpiece standard at the top of its target to reduce the large particles affect the quality of films. Substrate thermal conduction heating, the temperature can hit 100 ° C above the temperature was set up control points. about ± 2% accuracy.
5) Molecular pump vacuum system

Best suited to :
Based on the above functions, the membrane equipment used in laboratory research. : Metal films can be deposited, a variety of chemical vapor deposition diamond films is the ideal research equipment.

Configuration and main technical parameters:
1) base pressure 8×10-5 Pa
2) Working vacuum pressure 8×10-4 Pa
3) membrane uniformity ≤±5%
4) Target utilization rate ≥60%
5) workinpiece temperature room temperature ----1000 ° C  an be controlled
6) target size 51×D5mm(2inch)
7) Target power DC300W or RF500W
8) Plasma body is focused relatively on the density: 1:3
9) Main function: The magnetism accuses of sputter, PCVD, PECVD and vacuum to interlock and protect.